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Launch and Protect! RASK and e-Residency Host Joint Workshop during Defence Week
Launch and Protect! RASK and e-Residency Host Joint Workshop during Defence Week
As part of the Estonian Defence Week 2025 programme, RASK and Estonia’s e-Residency will host a joint workshop: “Launch and Protect: Building a Defence Tech Company in Estonia.”
The workshop will explore how e-Residency enables entrepreneurs to establish and manage an EU-registered company entirely online, as well as the practical and legal steps required to operate in the defence industry.
Speakers include Liina Vahtras, Managing Director of the e-Residency programme, RASK Partner Timo Kullerkupp, and Attorney-at-Law Artur Sanglepp. Sanglepp will also share recent experiences from Ukraine, where he advised local defence technology start-ups in cooperation with the international defence industry investment fund Darkstar.
The workshop aims to demonstrate how Estonia’s digital ecosystem and flexible legal framework provide defence technology companies with a secure and transparent path to international growth – a strong example of public innovation and legal expertise working together in a strategically important field.
The workshop will explore how e-Residency enables entrepreneurs to establish and manage an EU-registered company entirely online, as well as the practical and legal steps required to operate in the defence industry.
Speakers include Liina Vahtras, Managing Director of the e-Residency programme, RASK Partner Timo Kullerkupp, and Attorney-at-Law Artur Sanglepp. Sanglepp will also share recent experiences from Ukraine, where he advised local defence technology start-ups in cooperation with the international defence industry investment fund Darkstar.
The workshop aims to demonstrate how Estonia’s digital ecosystem and flexible legal framework provide defence technology companies with a secure and transparent path to international growth – a strong example of public innovation and legal expertise working together in a strategically important field.